The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Aug. 12, 2009
Shuichi Nagamine, Koshi, JP;
Naofumi Kishita, Koshi, JP;
Satoshi Biwa, Koshi, JP;
Kouji Fujimura, Koshi, JP;
Shuichi Nagamine, Koshi, JP;
Naofumi Kishita, Koshi, JP;
Satoshi Biwa, Koshi, JP;
Kouji Fujimura, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Disclosed is a liquid processing apparatus capable of increasing the number of arranged substrate retainers without increasing the total exhaust amount of the liquid processing apparatus. A N-number (N is an integer identical to or greater than three) of cup bodies are inhaled and exhausted in total exhaust amount E through a plurality of separate exhaustion passage each having a first damper, and through a common exhaustion passage connected in common downstream of the separate exhaustion passages. The first dampers are configured such that an external air is received from the cup body in a first intake amount of external air Efor one of the cup bodies where a chemical liquid nozzle is placed at a setting location facing a wafer, and an external air is received from each of the other cup bodies in a second intake amount of external air Eless than the first amount Eand the intake amount of external air from both each of the other cup bodies and each of branched passages equals (E−E)/(n−1).