The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Jul. 12, 2011
Yasushi Takiguchi, Koshi, JP;
Taro Yamamoto, Koshi, JP;
Tsutomu Yamahata, Koshi, JP;
Akihiro Fujimoto, Koshi, JP;
Kouji Fujimura, Koshi, JP;
Yasushi Takiguchi, Koshi, JP;
Taro Yamamoto, Koshi, JP;
Tsutomu Yamahata, Koshi, JP;
Akihiro Fujimoto, Koshi, JP;
Kouji Fujimura, Koshi, JP;
Tokyo Electron Limited, Minato-Ku, JP;
Abstract
To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing moduleand a second processing module. On the other hand, the developing nozzle, which is used in the method in which the nozzle is engaged with the process for a shorter period of time, is used in common in the first liquid processing moduleand the second liquid processing module. The common developing nozzle is configured to wait on an intermediate position between the modulesand