Kariya, Japan

Kouji Eguchi


Average Co-Inventor Count = 1.9

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014-2022

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5 patents (USPTO):Explore Patents

Title: Kouji Eguchi: Innovator in Semiconductor Technology

Introduction

Kouji Eguchi is a prominent inventor based in Kariya, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work has been instrumental in advancing the efficiency and functionality of semiconductor devices.

Latest Patents

Eguchi's latest patents include a semiconductor device that features a Schottky diode and a semiconductor substrate. This innovative device includes a Schottky electrode placed on the first surface of the substrate, which is made of a metal material that is a columnar crystal. Notably, the content of carbon on the Schottky electrode is less than 6×10 cm in at least part of the area. Another significant patent is a semiconductor wafer and semiconductor device manufacturing method. This method involves a semiconductor wafer where the width of a dicing line is larger than the cut region to be diced. The design allows for efficient dicing without damaging the pads formed on the chip regions.

Career Highlights

Kouji Eguchi is currently employed at Denso Corporation, a leading company in the automotive technology sector. His work at Denso has allowed him to apply his innovative ideas in practical applications, contributing to the company's reputation for excellence in semiconductor technology.

Collaborations

Eguchi has collaborated with notable coworkers, including Youhei Oda and Takashi Nakano. Their combined expertise has fostered a productive environment for innovation and development in semiconductor technologies.

Conclusion

Kouji Eguchi's contributions to semiconductor technology through his patents and work at Denso Corporation highlight his role as a key innovator in the field. His advancements continue to influence the industry and pave the way for future innovations.

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