Kanagawa, Japan

Kouji Arita

This inventor holds 3 USPTO granted patents. Top assignee: Nec Electronics Corporation. Active years: 2006-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kouji Arita. Retrieved from https://idiyas.com/inventor/kouji-arita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 2

Forward Citations = 18(Granted Patents)


Location History:

  • Kanagawa, JP (2006 - 2008)
  • Kawasaki, JP (2009)

Company Filing History:


Years Active: 2006-2009

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3 patents (USPTO):Explore Patents

Title: **Innovator Kouji Arita: Advancing Semiconductor Technology**

Introduction

Kouji Arita, an accomplished inventor based in Kanagawa, Japan, has contributed significantly to the field of semiconductor technology. With a total of three patents to his name, Arita's work focuses on enhancing the performance and reliability of semiconductor devices through innovative materials and designs.

Latest Patents

One of Kouji Arita's latest patents introduces a carbon-containing silicon oxide film with high ashing tolerance and adhesion. This invention addresses the need for improved interlayer insulating films in semiconductor devices. The patent details how the interlayer insulating film is formed on or over a semiconductor substrate, featuring an opening that reaches a lower layer metal wiring conductor. The film contains a silicon oxide (SiOCH) matrix characterized by a specific ratio of Si—CH2 to Si—CH3 bonds, ensuring enhanced performance in various applications.

Another notable patent appears to complement this advancement, further emphasizing the low dielectric constant of the insulating film, showcasing its practical use in semiconductor interlayer insulating films. Arita's contributions in this area reflect the ongoing demand for improved materials in the ever-evolving tech industry.

Career Highlights

Kouji Arita currently works at NEC Electronics Corporation, where he has been instrumental in driving semiconductor innovations. His role in the company highlights a commitment to advancing technology by developing cutting-edge materials that improve device functionality and durability.

Collaborations

Arita's work has also involved collaboration with notable colleagues such as Sadayuki Ohnishi and Tatsuya Usami. Working alongside these talented peers has enhanced his research and development efforts, enabling the successful application of his innovations in the semiconductor field.

Conclusion

Kouji Arita’s innovations in the area of semiconductor materials position him as a key figure in the technology sector. With his extensive understanding of carbon-containing films and their application in interlayer insulating films, he continues to make valuable contributions that could shape the future of semiconductor devices. As the industry moves forward, Arita's work is likely to play a pivotal role in driving advancements in electronic components and systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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