Kouichiro Narimatsu

Title: Kouichiro Narimatsu: Innovator in Phase Shift Mask Technology

Introduction

Kouichiro Narimatsu is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of phase shift masks. With a total of 2 patents, his work has advanced the technology used in photolithography processes.

Latest Patents

Narimatsu's latest patents focus on the design and manufacturing methods of phase shift masks. One of his key inventions involves a second light transmit portion of a phase shift mask, which is formed from materials such as molybdenum silicide nitride oxide and chromium oxide. This innovative design converts the phase of transmitted exposure light by 180 degrees, achieving a transmittance of at least 2% and less than 5%. The manufacturing method utilizes a sputtering technique, allowing for the formation of the second light transmit portion with reduced defects and errors in the production process.

Career Highlights

Throughout his career, Kouichiro Narimatsu has worked with prominent companies in the technology sector. He has been associated with Ulvac Coating Corporation and Mitsubishi Electric Corporation, where he has contributed to various projects related to semiconductor technology. His expertise in the field has made him a valuable asset to these organizations.

Collaborations

Narimatsu has collaborated with several professionals in his field, including Akihiko Isao and Ryoichi Kobayashi. These collaborations have further enhanced his work and contributed to the advancements in phase shift mask technology.

Conclusion

Kouichiro Narimatsu's contributions to the field of semiconductor manufacturing, particularly through his patents on phase shift masks, have had a lasting impact on the industry. His innovative approaches and collaborations with other experts continue to influence advancements in photolithography technology.