Kouichi Ishiyama

Title: Kouichi Ishiyama: Innovator in Sputtering Technology

Introduction

Kouichi Ishiyama is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 9 patents. His work focuses on improving the quality and efficiency of sputtering targets, which are essential in various manufacturing processes.

Latest Patents

Ishiyama's latest patents include innovative methods for producing sputtering targets composed of Cu—Ga sintered compacts. One of his patents describes a sputtering target that has a reduced oxygen content, which helps suppress abnormal discharges. This target features a Ga content of 20 atomic percent or higher and less than 30 atomic percent, with the balance being Cu and inevitable impurities. The oxygen content is maintained at 100 ppm or lower, and the average grain size is 100 micrometers or less. Another patent focuses on a Cu—Ga alloy sputtering target, which also aims to reduce oxygen content and prevent abnormal discharging. This invention includes a sintered body with Na compound phases dispersed in a matrix of the γ and δ phases of a Cu—Ga alloy.

Career Highlights

Throughout his career, Kouichi Ishiyama has worked with prominent companies such as Mitsubishi Materials Corporation and Mitsubishi Electric Corporation. His experience in these organizations has allowed him to refine his expertise in materials science and engineering.

Collaborations

Ishiyama has collaborated with notable colleagues, including Masami Miyake and Takuo Takeshita. Their combined efforts have contributed to advancements in sputtering technology and materials development.

Conclusion

Kouichi Ishiyama's innovative work in sputtering technology has led to significant advancements in the field. His patents reflect a commitment to improving manufacturing processes and materials quality. His contributions continue to influence the industry and inspire future innovations.