Saitama, Japan

Kotaro Kubo

This inventor holds 1 USPTO granted patent. Top assignee: Jsr Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kotaro Kubo. Retrieved from https://idiyas.com/inventor/kotaro-kubo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovations of Kotaro Kubo

Introduction

Kotaro Kubo is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of chemical-mechanical polishing. His innovative work has led to the development of a unique polishing pad that enhances the efficiency of polishing processes.

Latest Patents

Kubo holds a patent for a chemical-mechanical polishing pad and method. This invention includes a polishing layer with a recess formed in its surface. The polishing layer features a surface layer that constitutes at least the inner side of the recess. The invention specifies a ratio (D1/D2) of an average opening ratio D1(%) to an average opening ratio D2(%) ranging from 0.01 to 0.5. The average opening ratio D1 is determined when the polishing layer is immersed in water at 23°C for one hour, while D2 is measured from a cross-section of the polishing layer that does not intersect the surface layer under the same conditions.

Career Highlights

Kotaro Kubo is currently employed at JSR Corporation, where he continues to innovate in the field of chemical-mechanical polishing. His work has been instrumental in advancing the technology used in various polishing applications.

Collaborations

Kubo has collaborated with notable colleagues, including Yukio Hosaka and Takahiro Okamoto. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Kotaro Kubo's contributions to the field of chemical-mechanical polishing exemplify the impact of innovative thinking in technology. His patent and ongoing work at JSR Corporation highlight the importance of advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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