Kotaro Kihara

Title: Innovations by Kotaro Kihara

Introduction

Kotaro Kihara is a notable inventor based in Kawasaki-shi, Japan. He has made significant contributions to the field of semiconductor technology, holding two patents that enhance the performance and manufacturing processes of semiconductor devices.

Latest Patents

Kihara's latest patents include a method of forming a via in a semiconductor device. This process involves burying a tungsten member into a blind hole formed in a wafer, which allows for a reduction in warp and prevents peeling of underlying layers. His second patent focuses on improving the performance of semiconductor devices by utilizing a metal silicide layer, including nickel platinum silicide, formed through a salicide process. This innovation enhances the functionality of n-channel and p-channel type MISFETs.

Career Highlights

Kotaro Kihara is currently employed at Renesas Electronics Corporation, where he continues to develop cutting-edge technologies in the semiconductor industry. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.

Collaborations

Kihara has collaborated with notable coworkers such as Kazuhito Ichinose and Tatsunori Murata, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Kotaro Kihara's innovative work in semiconductor technology exemplifies the impact of dedicated inventors in advancing modern electronics. His patents reflect a commitment to improving device performance and manufacturing processes, solidifying his role as a key figure in the industry.