Kotaro Horikoshi

Title: Kotaro Horikoshi: Innovator in Semiconductor Technology

Introduction

Kotaro Horikoshi is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on improving manufacturing methods for semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of his latest patents involves a manufacturing method of a semiconductor device. This method includes several steps, such as preparing a semiconductor substrate with a silicon nitride film on its rear surface. It also involves forming an interlayer insulating film with a via hole on the main surface of the substrate and selectively filling the via hole. Additionally, the method requires performing wafer rear surface cleaning to expose the silicon nitride film and forming a photoresist film on the interlayer insulating film and via-fill. This process is conducted in an atmosphere with an ammonium ion concentration of 1000 µg/m³ or less. Another patent focuses on providing a semiconductor device with high reliability while keeping manufacturing costs low. This is achieved through dry etching for an insulating film using a mixed gas containing CF gas and CHF gas.

Career Highlights

Kotaro Horikoshi is currently employed at Renesas Electronics Corporation, where he continues to innovate in semiconductor manufacturing. His expertise and dedication to the field have made him a valuable asset to the company.

Collaborations

Throughout his career, Horikoshi has collaborated with notable colleagues, including Toshikazu Hanawa and Masatoshi Akaishi. These partnerships have contributed to the advancement of semiconductor technologies.

Conclusion

Kotaro Horikoshi is a key figure in the semiconductor industry, with a focus on developing efficient manufacturing methods. His contributions have the potential to enhance the reliability and cost-effectiveness of semiconductor devices.