Kyoto, Japan

Kota Sotoku

USPTO Granted Patents = 6 

Average Co-Inventor Count = 2.2

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017-2022

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6 patents (USPTO):Explore Patents

Title: Kota Sotoku: Pioneer in Substrate Processing Innovations

Introduction

Kota Sotoku, an accomplished inventor based in Kyoto, Japan, has made significant strides in the field of substrate processing technology. With a remarkable portfolio consisting of six patents, Sotoku continues to push the boundaries of innovation.

Latest Patents

Two of Kota Sotoku's latest patents demonstrate his ingenuity and technical prowess. The first patent is a "Resist Removing Method and Resist Removing Apparatus," which involves a hot plate disposed in a processing space. This apparatus efficiently removes resist from substrates while preventing popping effects by utilizing ozone gas and a controlled moving mechanism for precise substrate positioning.

The second patent, "Substrate Processing Method and Substrate Processing Device," outlines a method for stripping a hardened resist layer from a substrate's surface. By employing a plural-fluid nozzle that mixes ozone gas with superheated steam, this innovative approach enables efficient resist removal by discharging a mixture that contains ozone water and liquid drops, enhancing the stripping process.

Career Highlights

Kota Sotoku has dedicated his career to advancing substrate processing technologies. His work at Screen Holdings Co., Ltd. reflects a commitment to innovation and the development of cutting-edge solutions that cater to the industry's needs. His impact is highly regarded in the semiconductor manufacturing sector.

Collaborations

Throughout his journey, Kota Sotoku has collaborated with talented individuals, including Masanobu Sato and Takayoshi Tanaka. Together, they share a vision of transforming substrate processing and enhancing the efficiency of manufacturing processes.

Conclusion

Kota Sotoku stands out as a key player in the field of substrate processing, with a focus on creating innovative methods that are both effective and efficient. His contributions, marked by multiple patents and collaborations, reflect a passion for innovation that will undoubtedly continue to shape the future of the industry.

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