The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Feb. 14, 2017
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventor:
Kota Sotoku, Kyoto, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/42 (2006.01); H01L 21/304 (2006.01); H01L 21/311 (2006.01); H01L 21/67 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/42 (2013.01); G03F 7/423 (2013.01); G03F 7/427 (2013.01); H01L 21/027 (2013.01); H01L 21/304 (2013.01); H01L 21/31133 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01);
Abstract
The substrate processing method is a substrate processing method for removing a resist having a hardened layer from a substrate on a surface of which the resist is formed, including: a substrate holding step of holding the substrate; and a resist stripping step of stripping the resist from the surface of the substrate by supplying ozone gas and superheated steam to a plural-fluid nozzle for producing liquid drops through mixing a plurality of fluids to discharge mixed gas of ozone gas and superheated steam containing liquid drops of ozone water produced by mixing ozone gas and superheated steam from the plural-fluid nozzle toward the surface of the substrate.