Kosei Ueda

Title: Kosei Ueda: Innovator in Plasma Etching Technology

Introduction

Kosei Ueda is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma etching technology, holding a total of 3 patents. His innovative methods have advanced the capabilities of semiconductor manufacturing processes.

Latest Patents

One of Ueda's latest patents is a plasma etching method that allows for the formation of holes with a required opening diameter in a silicon nitride layer. This method effectively suppresses the narrowing of the tip end portion of the hole. The process involves supplying a processing gas containing oxygen and fluorocarbon into a plasma processing apparatus. It includes a first process of etching a silicon nitride layer of a processing target object with a first mask by exciting the processing gas into plasma. Notably, this second process is performed while gradually reducing the temperature of the processing target object from a first temperature of 80°C to a second temperature of 40°C.

Another significant patent involves a plasma etching method where a substrate with an oxide film, a hard mask layer, and a patterned photoresist is loaded into a processing chamber. A processing gas containing CF, a rare gas, and oxygen is supplied, generating plasma by applying high-frequency power to the electrodes. This method enhances the precision and efficiency of the etching process.

Career Highlights

Kosei Ueda is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in developing advanced technologies that improve manufacturing processes and product quality.

Collaborations

Ueda has collaborated with notable colleagues, including Hikoichiro Sasaki and Yoshinobu Hayakawa. Their combined expertise has contributed to the success of various projects and innovations in the field.

Conclusion

Kosei Ueda's contributions to plasma etching technology have established him as a key figure in the semiconductor industry. His innovative patents and collaborative efforts continue to influence advancements in manufacturing processes.