Company Filing History:
Years Active: 2024
Title: Innovations by Kok How Tan
Introduction
Kok How Tan is a notable inventor based in Singapore, recognized for his contributions to the field of plasma technology. He holds 2 patents that showcase his innovative approach to cathode arc sources and their applications.
Latest Patents
His latest patents include a cathode arc source that comprises a cathode target, multiple magnetic field sources, and methods for striking the cathode target. This invention allows for the deposition of coatings using the described cathode arc source. Another significant patent involves a filter for a cathode arc source, designed to remove macroparticles from plasma. This filter features a duct with bends and magnetic field sources that steer plasma effectively.
Career Highlights
Kok How Tan is associated with Nanofilm Technologies International Limited, where he applies his expertise in developing advanced technologies. His work has significantly impacted the efficiency and effectiveness of plasma deposition processes.
Collaborations
He has collaborated with notable coworkers, including Xu Shi and Ming Chu Yang, contributing to various innovative projects within the company.
Conclusion
Kok How Tan's inventions in cathode arc technology reflect his commitment to advancing the field. His patents not only demonstrate his innovative spirit but also contribute to the broader scientific community.