Nanofilm Technologies International Limited

Kok How Tan

Xu Shi

Ming Chu Yang

A cathode arc source comprises: a cathode target; a first magnetic field source located above the target; a second magnetic field source located below the target; and a third magnetic field source located between the first and second magnetic field sources and having an opposite polarity to the first magnetic field source; wherein the resultant magnetic field from the first, second and third magnetic field sources has zero field strength in a direction substantially normal to the target at a position above the target. The invention also provides methods of striking a cathode target and methods of depositing coatings which can be carried out using the cathode arc source described herein.

Cathode arc source

A filter () for a cathode arc source comprises: a filter duct having at least one bend (), and a first magnetic field source for steering plasma through the filter duct for removal of macroparticles from the plasma; wherein the apparatus comprises a second magnetic field source () which is rotatably mounted surrounding a portion of the filter duct. Cathode arc sources () and cathode arc deposition apparatuses () comprise the filters described herein, and methods of filtering macroparticles from a beam of plasma emitted from a cathode arc source use the filters.

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Singapore, Singapore

Kok How Tan