The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2024
Filed:
Jun. 18, 2021
Applicant:
Nanofilm Technologies International Limited, Singapore, SG;
Inventors:
Assignee:
Nanofilm Technologies International Limited, Singapore, SG;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H05H 1/50 (2006.01); H01J 37/34 (2006.01); C23C 14/32 (2006.01);
U.S. Cl.
CPC ...
H05H 1/50 (2013.01); C23C 14/325 (2013.01); H01J 37/32055 (2013.01); H01J 37/32614 (2013.01); H01J 37/3402 (2013.01);
Abstract
A filter () for a cathode arc source comprises: a filter duct having at least one bend (), and a first magnetic field source for steering plasma through the filter duct for removal of macroparticles from the plasma; wherein the apparatus comprises a second magnetic field source () which is rotatably mounted surrounding a portion of the filter duct. Cathode arc sources () and cathode arc deposition apparatuses () comprise the filters described herein, and methods of filtering macroparticles from a beam of plasma emitted from a cathode arc source use the filters.