Location History:
- Osaka, JP (1986 - 1992)
- Higashiosaka, JP (1986 - 1994)
Company Filing History:
Years Active: 1986-1994
Title: The Innovations of Koji Minami
Introduction
Koji Minami is a prominent inventor based in Higashiosaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work primarily focuses on the development of amorphous silicon films and their applications in photo semiconductor devices.
Latest Patents
One of Koji Minami's latest patents involves an amorphous silicon film that contains not less than 30 atomic percent hydrogen. This film includes silicon atoms that are joined with one hydrogen atom and silicon atoms that are joined with two hydrogen atoms. The ratio of silicon atoms joined with two hydrogen atoms to those joined with one hydrogen atom is not more than 0.4. The production of this amorphous silicon film is achieved through plasma-assisted chemical vapor deposition at a substrate temperature of not more than 100 degrees Celsius. During this process, hydrogen and silane are supplied in a predetermined ratio, with the flow of hydrogen being not less than that of silane.
Career Highlights
Throughout his career, Koji Minami has worked with notable companies such as Sanyo Electric Co., Ltd. and Sango Electric Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Koji Minami has collaborated with several professionals in his field, including Masayuki Iwamoto and Toshihiko Yamaoki. These collaborations have further enhanced his research and development efforts in the semiconductor industry.
Conclusion
Koji Minami's contributions to the field of semiconductor technology are noteworthy, particularly his innovations in amorphous silicon films. His patents reflect a deep understanding of materials science and engineering, making him a significant figure in the industry.