Koji Atoh

Title: Koji Atoh: Innovator in Substrate Cleaning Technology

Introduction

Koji Atoh is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of substrate cleaning technology, holding a total of 4 patents. His innovative approaches have led to advancements in cleaning apparatuses that are essential in various industries.

Latest Patents

Atoh's latest patents include a substrate cleaning apparatus and cleaning member. This cleaning apparatus is designed to effectively clean a substrate by utilizing a cleaning member and a cleaning member carrier. The carrier holds the cleaning member and brings it into contact with the substrate that requires cleaning. Additionally, a sensor is incorporated to detect the presence or absence of the cleaning member. The cleaning process is achieved by causing relative movement between the cleaning member and the substrate while maintaining contact between the two.

Career Highlights

Koji Atoh is currently employed at Ebara Corporation, a company known for its innovative solutions in fluid handling and environmental technologies. His work at Ebara has allowed him to focus on developing advanced cleaning technologies that enhance efficiency and effectiveness in substrate cleaning.

Collaborations

Atoh has collaborated with notable colleagues such as Fumitoshi Oikawa and Hiroshi Sotozaki. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in the field.

Conclusion

Koji Atoh's contributions to substrate cleaning technology exemplify his dedication to innovation and excellence. His patents and work at Ebara Corporation highlight his role as a key figure in advancing cleaning technologies.