Saku, Japan

Koichi Terunuma


Average Co-Inventor Count = 4.6

ph-index = 4

Forward Citations = 122(Granted Patents)


Location History:

  • Nagano, JP (2006 - 2009)
  • Saku, JP (2006 - 2010)

Company Filing History:


Years Active: 2006-2010

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5 patents (USPTO):Explore Patents

Title: Koichi Terunuma: Innovator in Magnetic Head Technology

Introduction

Koichi Terunuma is a prominent inventor based in Saku, Japan. He has made significant contributions to the field of magnetic head technology, holding a total of 5 patents. His innovative work has addressed critical challenges in the design and manufacturing of magnetic heads.

Latest Patents

Among his latest patents is the "Narrow track CPP head with bias cancellation." This invention tackles the issue of increased edge sensitivity that arises from reducing the spacing between bias magnets in a CPP head. Terunuma's solution involves limiting the width of the bias cancellation layer and adding an extra layer of insulation. This design ensures that the current flows only through the central area of the device, thereby minimizing edge reading sensitivity. Another notable patent is the "Process to manufacture narrow track CPP head with bias cancellation," which employs similar principles to enhance the performance of magnetic heads.

Career Highlights

Koichi Terunuma is currently associated with Headway Technologies, Incorporated, where he continues to push the boundaries of innovation in magnetic technology. His work has been instrumental in advancing the capabilities of magnetic heads used in various applications.

Collaborations

Terunuma has collaborated with notable colleagues, including Kochan Ju and Jei-Wei Chang, contributing to a dynamic environment of innovation and research.

Conclusion

Koichi Terunuma's contributions to magnetic head technology exemplify the spirit of innovation. His patents reflect a deep understanding of the challenges in the field and a commitment to developing effective solutions. His work continues to influence the industry and inspire future advancements.

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