The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Nov. 12, 2003
Applicants:
Jei-wei Chang, Cupertino, CA (US);
Koichi Terunuma, Saku, JP;
Youfeng Zheng, San Jose, CA (US);
Kochan Ju, Monte Sereno, CA (US);
Inventors:
Jei-Wei Chang, Cupertino, CA (US);
Koichi Terunuma, Saku, JP;
Youfeng Zheng, San Jose, CA (US);
Kochan Ju, Monte Sereno, CA (US);
Assignee:
Headway Technologies, Inc., Milpitas, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/23 (2006.01); G11B 5/187 (2006.01);
U.S. Cl.
CPC ...
Abstract
The problem of increased edge sensitivity associated with the reduction of the spacing between bias magnets in a CPP head has been solved by limiting the width of the bias cancellation layer and by adding an extra layer of insulation to ensure that current through the device flows only through its central area, thereby minimizing its edge reading sensitivity.