Tokyo, Japan

Koichi Kuhara

This inventor holds 2 USPTO granted patents. Top assignee: Sanyo Electric Co., Ltd.. Active years: 2006-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koichi Kuhara. Retrieved from https://idiyas.com/inventor/koichi-kuhara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 7.0

ph-index = 2

Forward Citations = 77(Granted Patents)


Location History:

  • Oizumi-machi, JP (2006)
  • Tokyo, JP (2010)

Company Filing History:


Years Active: 2006-2010

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2 patents (USPTO):Explore Patents

Title: Koichi Kuhara: Innovator in Semiconductor Manufacturing

Introduction

Koichi Kuhara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase his innovative approaches.

Latest Patents

Kuhara's latest patents focus on advanced manufacturing methods for semiconductor devices. One patent describes a process where a glass substrate is bonded through a resin to the top surface of a semiconductor wafer, which has a first wiring formed on it. A V-shaped groove is created by notching from the back surface of the wafer. A second wiring, connected to the first wiring and extending over the back surface, is formed. A protection film, composed of an organic resin or a photoresist layer, is applied to protect the second wiring, with an opening created by spray coating. Additionally, a conductive terminal is formed using the protection film as a solder mask, and a cushioning material may be added to the back surface of the wafer.

Another patent outlines a similar manufacturing method, where a first glass substrate is bonded to the top surface of a semiconductor wafer, and a second glass substrate is bonded to the back surface. A V-shaped groove is notched from the second glass substrate through part of the first glass substrate. The second wiring extends to the surface of the second glass substrate, and a protection film is formed on the second wiring by spray coating. A conductive terminal is again created using the protection film as a solder mask, with the possibility of adding a cushioning material on the second glass substrate.

Career Highlights

Kuhara has built a successful career at Sanyo Electric Co., Ltd., where he has been instrumental in developing innovative semiconductor technologies. His work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Kuhara has collaborated with notable colleagues, including Hiroyuki Shinogi and Yoshinori Seki. These collaborations have fostered a creative environment that has led to groundbreaking advancements in the semiconductor field.

Conclusion

Koichi Kuhara's contributions to semiconductor manufacturing through his innovative patents highlight his expertise and dedication to advancing technology. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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