This inventor holds 4 USPTO granted patents. Top assignee: Canon Kabushiki Kaisha. Active years: 2024-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2026
Title: Kohei Senshu: Innovator in Detection and Imprint Technologies
Introduction
Kohei Senshu is a prominent inventor based in Tochigi, Japan. He has made significant contributions to the fields of detection devices and imprint technologies. With a total of 4 patents to his name, Senshu continues to push the boundaries of innovation in his field.
Latest Patents
Senshu's latest patents include a detection device and method, as well as a lithography apparatus and article manufacturing method. The detection device is designed to detect the relative position between first and second marks arranged to be superimposed. It features an illumination system that illuminates the marks with first illumination light. The first detection system includes a first image sensor and a first aperture stop, which work together to form images of diffracted lights from the marks. A processor is utilized to obtain the relative position between the marks, with the first illumination light creating an asymmetric light intensity distribution on the pupil surface of the illumination system.
Additionally, his imprint apparatus is designed to form a pattern on a substrate by curing an imprint material through light irradiation. This apparatus includes a shutter plate and an adjuster that controls the light irradiation to the imprint material. The shutter plate has a first passing portion that allows light to irradiate a portion of the imprint material, while the adjuster can tilt the shutter plate to optimize the process.
Career Highlights
Kohei Senshu is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His work at Canon has allowed him to develop innovative solutions that enhance the efficiency and accuracy of manufacturing processes.
Collaborations
One of his notable collaborators is Toshiki Iwai, with whom he has worked on various projects to advance their shared goals in technology and innovation.
Conclusion
Kohei Senshu's contributions to detection and imprint technologies exemplify his commitment to innovation. His patents reflect a deep understanding of complex systems and a drive to improve manufacturing processes. Senshu's work continues to influence the industry and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile