The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Aug. 04, 2022
Canon Kabushiki Kaisha, Tokyo, JP;
Kohei Senshu, Tochigi, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A holding device in a lithography apparatus for transferring a pattern formed on a mold to a substrate, for attracting/holding the mold or substrate by a reduced pressure, comprising: a holding unit holding the mold or substrate, having concave portions forming spaces together with the mold or substrate; a first pressure mechanism to depressurize at least one first space among the spaces formed by the mold or substrate and the holding unit; a second pressure mechanism setting at least one second space among the spaces to a pressure different from the first space; a controller controlling the first and second pressure mechanisms such that the first and second spaces are adjacent to each other; a measuring unit measuring a flow rate of at least the first or second pressure mechanisms; and a determining unit determining an abnormality related to attracting/holding of the mold or substrate based on the flow rate.