Holding device, method of determining attraction abnormality in holding device, lithography apparatus, and method of manufacturing article

Abstract

A holding device in a lithography apparatus for transferring a pattern formed on a mold to a substrate, for attracting/holding the mold or substrate by a reduced pressure, comprising: a holding unit holding the mold or substrate, having concave portions forming spaces together with the mold or substrate; a first pressure mechanism to depressurize at least one first space among the spaces formed by the mold or substrate and the holding unit; a second pressure mechanism setting at least one second space among the spaces to a pressure different from the first space; a controller controlling the first and second pressure mechanisms such that the first and second spaces are adjacent to each other; a measuring unit measuring a flow rate of at least the first or second pressure mechanisms; and a determining unit determining an abnormality related to attracting/holding of the mold or substrate based on the flow rate.