This inventor holds 2 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignee: Ebara Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Kohei Ota - Innovator in Substrate Processing Technology
Introduction
Kohei Ota is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing technology. His innovative approach focuses on enhancing the efficiency and effectiveness of substrate polishing methods.
Latest Patents
Kohei Ota holds a patent for a "Substrate processing apparatus and substrate processing method." This invention aims to suppress damage to the surface of a substrate during polishing while improving the polishing rate. The apparatus includes a table for supporting the substrate, a pad holder for holding a polishing pad, a nozzle for supplying polishing liquid, and a pad rotation mechanism. Notably, the pad holder features a discharge hole in the center of the holding surface, which is connected to a discharge passage that communicates with the outside of the pad holder.
Career Highlights
Ota is associated with Ebara Corporation, a leading company in the field of fluid machinery and environmental engineering. His work at Ebara has allowed him to develop and refine technologies that are crucial for substrate processing.
Conclusion
Kohei Ota's contributions to substrate processing technology exemplify the innovative spirit of modern inventors. His patent reflects a commitment to improving industrial processes and enhancing product quality.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile