Tokyo, Japan

Kohei Nawaoka

This inventor holds 6 USPTO granted patents and 3 published patent applications and 5 EPO patents. Top assignee: Tdk Corporation. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kohei Nawaoka. Retrieved from https://idiyas.com/inventor/kohei-nawaoka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 66.7

 

Average Co-Inventor Count = 4.2

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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6 patents (USPTO):Explore Patents

Title: Kohei Nawaoka: Innovator in Distortion Resistance Technology

Introduction

Kohei Nawaoka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of innovative films and sensors. With a total of 6 patents to his name, Nawaoka continues to push the boundaries of technology.

Latest Patents

Nawaoka's latest patents include a distortion resistance film and a pressure sensor. The distortion resistance film is designed to minimize property changes that occur with composition changes. This film is represented by the formula CrAlN, where the composition regions of x and y satisfy the conditions 25

Career Highlights

Throughout his career, Nawaoka has been associated with TDK Corporation, a leading company in electronic components. His work has focused on advancing sensor technology and materials that can withstand various physical stresses.

Collaborations

Nawaoka has collaborated with notable colleagues, including Ken Unno and Masanori Kobayashi. These partnerships have contributed to the successful development of his innovative technologies.

Conclusion

Kohei Nawaoka is a key figure in the field of distortion resistance technology, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to influence advancements in sensor technology and materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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