Koh Yee Wee

Title: **Innovations by Inventor Koh Yee Wee: Pioneering in Dual Damascene Technology**

Introduction

Koh Yee Wee, an accomplished inventor based in Johor, Malaysia, has made significant contributions to the field of semiconductor technology. With two notable patents to his name, she has been at the forefront of innovations that enhance interconnect structures and improve dual damascene fabrication processes.

Latest Patents

Koh Yee Wee's latest patents showcase her expertise in composite barriers and etch stop layers involving oxygen doped silicon carbide (SiC). The first patent introduces a dual damascene structure featuring a composite barrier/etch stop layer consisting of a lower silicon carbide layer and an upper oxygen doped SiC layer. This innovative approach involves several layers, including dielectric layers, and a strategically filled opening with a diffusion barrier layer and metal layer, optimizing the performance of interconnect structures.

Her second patent details a method for forming a dual damascene structure with improved performance. By utilizing an oxygen doped SiC as the first etch stop layer on a SiC barrier layer, she crafts a composite barrier/etch stop layer. This method emphasizes the selection of materials with lower dielectric constants and higher breakdown fields than traditional SiC, effectively improving the etch selectivity of various materials.

Career Highlights

Koh Yee Wee is currently employed at Chartered Semiconductor Manufacturing Ltd, where her skills are instrumental in advancing semiconductor technology. Her role has led to groundbreaking advancements that enhance performance and reliability in modern electronics.

Collaborations

Throughout her career, Koh Yee Wee has collaborated with esteemed colleagues, including Liu Huang and John Leonard Sudijono. Their collective expertise fosters an environment of innovation, contributing to successful developments in semiconductor manufacturing.

Conclusion

Koh Yee Wee stands out as an innovative inventor whose work is shaping the future of semiconductor technology. Her patents reflect a commitment to excellence and advancement in the industry, contributing to the reliable functioning of electronic devices worldwide. As technology progresses, her contributions will undoubtedly leave a lasting impact on the field.