Miyagi, Japan

Koei Ito

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023-2025

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3 patents (USPTO):

Title: Koei Ito: Innovator in Substrate Processing Technology

Introduction

Koei Ito is a notable inventor based in Miyagi, Japan, recognized for his contributions to substrate processing technology. With a total of two patents to his name, he has made significant advancements in the field, particularly through his latest innovations.

Latest Patents

Koei Ito's latest patents include a substrate processing apparatus and a maintenance method for the substrate processing apparatus. The substrate processing apparatus features a chamber with a sidewall that has an opening, a substrate support within the chamber, and a support member positioned above the substrate support. Additionally, it includes an inner wall member with a ceiling portion located above the substrate support and below the support member. A contact member is attached to either the support member or the inner wall member, allowing for detachable fixing of the inner wall member to the support member by applying a spring reaction force. An actuator is also included to move the inner wall member downward, facilitating the release of the fixing. The substrate support itself consists of a base and a substrate support layer made from an insulating material, which houses an electrostatic internal electrode layer featuring a circular body portion and several protruding portions.

Career Highlights

Koei Ito has built a successful career at Tokyo Electron Limited, where he has been instrumental in developing innovative technologies that enhance substrate processing. His work has contributed to the efficiency and effectiveness of various semiconductor manufacturing processes.

Collaborations

Koei Ito has collaborated with esteemed colleagues such as Shin Yamaguchi and Yasuharu Sasaki, further enriching his work and expanding the impact of his inventions.

Conclusion

Koei Ito's contributions to substrate processing technology exemplify his innovative spirit and dedication to advancing the field. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a significant figure in the industry.

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