This inventor holds 2 USPTO granted patents. Top assignees: Siemens Aktiengesellschaft, International Business Machines Corporation. Active years: 2000-2003.
Company Filing History:
2 out of 30,294 
1 out of 166,159 
Years Active: 2000-2003
Title: Klaus Roithner: Innovator in Semiconductor Technology
Introduction
Klaus Roithner is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to gas distribution and chip yield improvement.
Latest Patents
Roithner's latest patents include a "Spatially uniform gas supply and pump configuration for large wafer diameters." This invention features a gas distribution plate designed for semiconductor processing chambers. The plate distributes gases uniformly across the surface of a semiconductor wafer, utilizing a planar member with gas outlets and a pump that maintains the desired concentration of reactant gases during processing. Another significant patent is the "Method and apparatus for preventing formation of black silicon on edges." This method enhances chip yield by reducing black silicon deposition on silicon wafers, ensuring that the remaining layers prevent redeposition of etched materials.
Career Highlights
Throughout his career, Klaus Roithner has worked with prominent companies such as Siemens Aktiengesellschaft and IBM. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Roithner has collaborated with notable professionals in the field, including Dung-Ching Perng and Ting Hao Wang. These collaborations have contributed to the advancement of semiconductor technologies and innovations.
Conclusion
Klaus Roithner's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor processing and chip manufacturing.