Paderborn, Germany

Klaus Lischka

This inventor holds 1 USPTO granted patent. Top assignee: Panalytical B.v.. Active years: 2006.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Klaus Lischka: Innovator in X-ray Technology

Introduction

Klaus Lischka is a notable inventor based in Paderborn, Germany. He has made significant contributions to the field of X-ray technology, particularly through his innovative patent related to diffractometry. His work has implications for various scientific and industrial applications.

Latest Patents

Klaus Lischka holds a patent for a diffractometer, which features a monochromator used to direct X-rays from an X-ray source onto a sample as a convergent beam. The sample is placed in a growth chamber and is rotated during the measurement process. Diffraction measurements are conducted in parallel with a multichannel detector. A specific reflection is utilized to ensure that the intensity versus angle graph measured in the multichannel detector provides valuable information about the vertical lattice parameter. To address the wobble introduced by the sample's rotation, short time measurements are taken and summed, enhancing the accuracy of the results.

Career Highlights

Klaus Lischka is currently employed at Panalytical B.V., where he continues to develop and refine technologies in the field of X-ray analysis. His expertise and innovative approach have positioned him as a key figure in advancing the capabilities of diffractometry.

Collaborations

Klaus has collaborated with Alexander Kharchenko, working together to push the boundaries of X-ray technology and improve measurement techniques.

Conclusion

Klaus Lischka's contributions to the field of X-ray technology through his patent for a diffractometer exemplify his innovative spirit and dedication to scientific advancement. His work continues to influence the industry and enhance measurement accuracy in various applications.

Profile summary based on public USPTO records.
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