Sagamihara, Japan

Kiyoshi Nozaki

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):Explore Patents

Title: Kiyoshi Nozaki: Innovator in Slurry Analysis Systems

Introduction

Kiyoshi Nozaki is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of slurry analysis systems, holding a total of 2 patents. His work focuses on developing innovative technologies that enhance the understanding and monitoring of slurries in various applications.

Latest Patents

Nozaki's latest patents include a fluid monitoring system designed for estimating a first characteristic of a slurry containing a plurality of particles suspended in a dispersion medium. This system features a slurry filter that effectively filters the slurry, along with a control system that estimates the first characteristic using the flow rate of a filtrate through the slurry filter and the slurry filtration pressure. Another significant patent is a slurry analysis system utilizing flow restriction. This system estimates the first characteristic of a slurry by incorporating a flow restriction assembly and a sensor assembly that senses conditions of the slurry as it flows through the assembly. The control and analysis system can select clogging behavior based on the sensed condition, further enhancing the accuracy of the analysis.

Career Highlights

Kiyoshi Nozaki is currently employed at Nikon Corporation, where he continues to innovate and develop advanced technologies in his field. His work has been instrumental in improving slurry analysis techniques, which are crucial for various industrial applications.

Collaborations

Throughout his career, Nozaki has collaborated with talented individuals such as Takashi Nagata and Ting-Chien Teng. These collaborations have contributed to the advancement of his projects and the successful development of his patented technologies.

Conclusion

Kiyoshi Nozaki is a prominent inventor whose work in slurry analysis systems has led to significant advancements in the field. His innovative patents and contributions to Nikon Corporation highlight his dedication to improving technology in this area.

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