The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Jun. 25, 2020
Applicant:
Nikon Corporation, Tokyo, JP;
Inventors:
Takashi Nagata, Castro Valley, CA (US);
Ting-Chien Teng, Fremont, CA (US);
Yohei Konishi, Tokyo, JP;
Kiyoshi Nozaki, Sagamihara, JP;
Assignee:
Nikon Corporation, , JP;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 15/06 (2006.01); G01N 11/04 (2006.01);
U.S. Cl.
CPC ...
G01N 15/0618 (2013.01); G01N 11/04 (2013.01);
Abstract
A slurry analysis system () for estimating a first characteristic of a slurry () having a plurality of particles () suspended in a dispersion medium () can include a slurry filter () that filters the slurry (); and a control system () that estimates the first characteristic of the slurry () using a flow rate of a filtrate () through the slurry filter () and a slurry filtration pressure of the slurry ().