This inventor holds 3 USPTO granted patents. Top assignee: Anelva Corporation. Active years: 1992-1999.
Location History:
- Fuchu, JP (1992 - 1994)
- Hachiouji, JP (1999)
Company Filing History:
Years Active: 1992-1999
Title: Kiyoshi Nashimoto: Innovator in Thin Film Technology
Introduction
Kiyoshi Nashimoto is a prominent inventor based in Fuchu, Japan. He has made significant contributions to the field of thin film technology, holding a total of 3 patents. His work focuses on advanced methods for depositing thin films, which are crucial in various applications, including semiconductor manufacturing.
Latest Patents
Nashimoto's latest patents include a method of depositing thin films by plasma-enhanced chemical vapor deposition (CVD). This innovative method involves introducing hydrogen or a mixture of hydrogen and nitrogen into a plasma-enhanced CVD reactor. The process generates plasma within the reactor, allowing for the introduction of a reaction gas that includes TiCl4, silane, and hydrogen. This results in the deposition of titanium films or titanium nitride films containing silicon on substrates.
Another notable patent addresses the control of temperature during substrate processing. This invention allows for precise temperature management of substrates, such as semiconductor wafers, during processes like sputtering, etching, and deposition. By measuring the temperature and emissivity of the substrate's surface in real-time, the system can adjust the temperature to ensure optimal processing conditions.
Career Highlights
Kiyoshi Nashimoto is associated with Anelva Corporation, where he has been instrumental in advancing thin film deposition technologies. His expertise in plasma-enhanced CVD and temperature control systems has positioned him as a key figure in the field.
Collaborations
Nashimoto has collaborated with notable colleagues, including Shigeru Mizuno and Manabu Tagami. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in thin film applications.
Conclusion
Kiyoshi Nashimoto's contributions to thin film technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field of semiconductor manufacturing and beyond.