Hyogo, Japan

Kiyoshi Maeda


Average Co-Inventor Count = 6.2

ph-index = 3

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1997-2002

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5 patents (USPTO):Explore Patents

Title: Kiyoshi Maeda: Innovator in Semiconductor Technology

Introduction

Kiyoshi Maeda is a prominent inventor based in Hyogo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative approaches have paved the way for advancements in manufacturing processes within the industry.

Latest Patents

Maeda's latest patents include a method of manufacturing semiconductor devices that introduces an improved etching technique. This method allows for the formation of a silicon nitride film with an adequate film thickness at the sidewall portion of a pattern. The process involves dry-etching a silicon nitride film that covers a stepped pattern, utilizing plasma of mixed gases containing CH₄ and O₂. As a result, a sidewall spacer of the silicon nitride film is formed at the sidewall of the pattern in a self-aligned manner. Another notable patent is a method of fabricating a semiconductor device, which involves forming a hard mask insulating layer on a gate electrode situated on a silicon substrate. This method includes the formation of an SiN sidewall spacer directly on a thin SiO₂ layer that covers the side surface of the gate electrode.

Career Highlights

Throughout his career, Kiyoshi Maeda has worked with notable companies, including Mitsubishi Electric Corporation. His work has significantly impacted the semiconductor industry, showcasing his expertise and innovative spirit.

Collaborations

Maeda has collaborated with esteemed colleagues such as Hiroshi Matsuo and Yuichi Yokoyama. Their combined efforts have contributed to the advancement of semiconductor technologies.

Conclusion

Kiyoshi Maeda's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of semiconductor manufacturing.

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