The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 1997
Filed:
Mar. 25, 1996
Masayuki Kobayashi, Kochi, JP;
Kiyoshi Maeda, Hyogo, JP;
Masato Toyota, Tokyo, JP;
Hiroshi Ohnishi, Tokyo, JP;
Hiroshi Tanaka, Tokyo, JP;
Toshio Komemura, Tokyo, JP;
Tamio Matsumura, Tokyo, JP;
Shikoku Instrumentation Co., Ltd., Kagawa, JP;
Ryoden Semiconductor System Engineering Corporation, Hyogo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
Components such as an earth plate, a gas introduction ring, and the like placed in a reaction chamber in a plasma apparatus are made of aluminum containing magnesium in a concentration of 2.2 to 2.8% by weight and are not coated with alumite. In addition, a heater incorporated in a section of the reaction chamber heats the section during a plasma cleaning process. Further, an electrical discharge chamber is also incorporated in the plasma apparatus for providing a plasma to the reaction chamber for efficient plasma cleaning of the apparatus.