Company Filing History:

13 out of 52,751

Kabushiki Kaisha Toshiba

patents

2 out of 2,916

Tokyo Shibaura Denki Kabushiki Kaisha

patents

Years Active: 1985-2006

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15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7047094 - LSI mask manufacturing system, LSI mask manufacturing method and LSI mask manufacturing program (2006-05-16),

2. 6447355 - Impregnated-type cathode substrate with large particle diameter low porosity region and small particle diameter high porosity region (2002-09-10),

3. 6304024 - Impregnated-type cathode substrate with large particle diameter low porosity region and small particle diameter high porosity region (2001-10-16),

4. 6077310 - Optical proximity correction system (2000-06-20),

5. 6047116 - Method for generating exposure data for lithographic apparatus (2000-04-04),

6. 6034469 - Impregnated type cathode assembly, cathode substrate for use in the (2000-03-07),

7. 6004701 - Method for designing Levenson photomask (1999-12-21),

8. 5879844 - Optical proximity correction method (1999-03-09),

9. 5795683 - Method and a system for designing a photomask for use in manufacture of (1998-08-18),

10. 5761075 - Apparatus for designing photomasks (1998-06-02),

11. 5541025 - Method and apparatus for designing photomasks (1996-07-30),

12. 5538815 - Method for designing phase-shifting masks with automatization capability (1996-07-23),

13. 4914304 - Charged-beam exposure system (1990-04-03),

14. 4538232 - Electron-beam lithographic apparatus (1985-08-27),

15. 4531191 - Electron beam pattern generation system (1985-07-23),

Title: The Innovations of Kiyomi Koyama: A Visionary in LSI Technology

Introduction

Kiyomi Koyama, a prominent inventor based in Yokohama, Japan, has made significant contributions to the field of lithography and electron emission technologies. With an impressive portfolio of 15 patents, Koyama continues to push the boundaries of innovation, paving the way for advancements in large-scale integrated (LSI) systems.

Latest Patents

Among Kiyomi Koyama's latest patents are groundbreaking methods and systems for LSI mask manufacturing. One of his notable inventions includes a computer-implemented method for LSI mask manufacturing. This method effectively stores performance information of a lithography unit in a database, streamlining the process of matching lithography units to user specifications. Another notable patent details an impregnated-type cathode substrate, which features a dual-region design. This substrate comprises a large particle diameter low porosity region and a small particle diameter high porosity region, facilitating enhanced electron emission performance.

Career Highlights

Kiyomi Koyama has held prominent roles at distinguished companies, including Toshiba Corporation and Tokyo Shibaura Electric Co., Ltd. His work has centered on developing and refining technologies that support advancements in both consumer electronics and industrial applications. His innovative mindset has allowed him to stand out in the competitive field of technology.

Collaborations

Throughout his career, Kiyomi has collaborated with esteemed colleagues such as Kazuko Yamamoto and Kazuko Oi. Their combined expertise and teamwork have further propelled the innovation of cutting-edge solutions in lithography and related engineering fields.

Conclusion

Kiyomi Koyama's contributions to the fields of lithography and electron emission illustrate the importance of innovation in modern technology. With his continued dedication and inventive spirit, Koyama remains a key figure in designing the future of integrated systems, inspiring the next generation of inventors and engineers.

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