The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 1996
Filed:
Sep. 14, 1993
Kazuko Oi, Tokyo, JP;
Shigehiro Hara, Kanagawa-ken, JP;
Kiyomi Koyama, Kanagawa-ken, JP;
Koji Hashimoto, Kanagawa-ken, JP;
Shinichi Ito, , JP;
Katsuya Okumura, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A method for designing a phase-shifting mask in a manner that a phase shifter of the mask is arranged so that a phase difference between light transmitted through clear areas with the phase shifter and light transmitted through clear areas without the phase shifter is set to 180.degree. or further different combination of phase differences being such as 0.degree., 90.degree. and 270.degree.. The method includes the steps of: defining a threshold value in a manner that the threshold value falls within a range which is possible to resolve using the phase-shifting masks; measuring a distance between neighboring shapes of the clear area; storing adjacent relationship of the neighboring shapes whose distance is less than the threshold; and automatically placing the phase shifter on one of the neighboring shapes of the clear areas in a manner that mutually neighboring clear area have an opposite phase to each other.