The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2000
Filed:
Mar. 18, 1998
Eiji Murakami, Kawasaki, JP;
Hitoshi Higurashi, Yokohama, JP;
Shigehiro Hara, Yokohama, JP;
Kiyomi Koyama, Yokohama, JP;
Takayuki Abe, Kawasaki, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
In a method of generating from design data the exposure data necessary for a multistage-deflection charged beam exposure device that has a main deflector and a sub-deflector and forms a pattern, before a shape larger than the size of a minimum subfield area is divided during the generation of subfield exposure data, the process of dividing the shape into shapes equal to or smaller than the size of a subfield area and restructuring the shape is performed. Moreover, after the overlapping cell arrays in the design data are changed into a cell array structure preventing the cell arrays from overlapping, the resulting cell arrays are subjected to a hierarchical shape data operation process and a formatting process, including compression, subfield division, and frame division. This makes it possible to reduce the amount of data supplied without increasing the time required to converting the design data into exposure data supplied to the charged beam exposure device.