The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2006
Filed:
Mar. 26, 2003
Kiyomi Koyama, Tokyo, JP;
Kiyomi Koyama, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A computer implemented method for LSI mask manufacturing stores performance information of a lithography unit, connected to a network, in a lithography unit database. The method receives a lithography data and a lithography reservation condition from a user terminal connected to the network. The method stores the lithography data in a lithography data database. The method searches for a lithography unit matching to the lithography reservation condition, generating a list of lithography units, and sending the list to the user terminal. In addition, the method receives information of a lithography unit specified by the user terminal and sending a lithography request to the lithography unit specified by the user terminal.