Tokyo, Japan

Kinya Miyashita



Average Co-Inventor Count = 2.1

ph-index = 5

Forward Citations = 61(Granted Patents)


Location History:

  • Kanagawa, JP (2007 - 2011)
  • Tokyo, JP (2011 - 2012)
  • Kawasaki, JP (1997 - 2013)

Company Filing History:


Years Active: 1997-2013

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12 patents (USPTO):Explore Patents

Title: Kinya Miyashita: Innovator in Substrate Suction Technology

Introduction

Kinya Miyashita is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate suction technology, holding a total of 12 patents. His innovative designs focus on improving the efficiency and effectiveness of substrate handling in various applications.

Latest Patents

Miyashita's latest patents include a substrate suction apparatus and a bipolar electrostatic chuck. The substrate suction apparatus features a vacuum suction mechanism combined with an electrostatic attraction mechanism, enhancing the planarity of processed subjects by improving the uniformity of vacuum suction power. This apparatus consists of a base board, a dielectric body, and both electrostatic and vacuum suction mechanisms. The dielectric body is constructed from multiple layers, while the electrostatic attraction mechanism utilizes attraction electrodes powered by a direct current supply.

The bipolar electrostatic chuck is designed to provide excellent dielectric breakdown strength and superior attracting performance. It minimizes the difficulty of dismounting samples from the attracting plane after voltage application. This chuck includes a first and second electrode within an insulator, allowing for an effective sample attracting surface.

Career Highlights

Throughout his career, Kinya Miyashita has worked with notable companies such as Creative Technology Corporation and Sohzohkagaku Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced technologies in substrate handling.

Collaborations

Miyashita has collaborated with esteemed colleagues, including Yoshiaki Tatsumi and Hiroshi Fujisawa. Their combined efforts have furthered advancements in the field of substrate suction technology.

Conclusion

Kinya Miyashita's innovative work in substrate suction technology has led to significant advancements in the industry. His patents reflect a commitment to improving manufacturing processes and enhancing product quality. His contributions continue to influence the field and inspire future innovations.

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