Creative Technology Corporation

Nisshinbo Industries, Inc.

Sohzohkagaku Co., Ltd.

Kawamura Sangyo Co., Ltd.

Kinya Miyashita

Yoshiaki Tatsumi

Hiroshi Fujisawa

Yoshihiro Watanabe

Tomoyuki Hayashi

Riichiro Harano

Provided is a substrate suction apparatus which has a vacuum suction mechanism and an electrostatic attraction mechanism, and improves planarity of a subject to be processed by improving uniformity in vacuum suction power. A method for manufacturing such substrate suction apparatus is also provided. A substrate suction apparatus () is provided with a base board (), a dielectric body (), an electrostatic attraction mechanism () and a vacuum suction mechanism (). Specifically, the dielectric body () is composed of a downmost dielectric layer (), an intermediate dielectric layer () and a topmost dielectric layer (). The electrostatic attraction mechanism () is composed of attraction electrodes () and a direct current power supply. The vacuum suction mechanism () is composed of a groove (), a suction channel (), a porous dielectric body () and the porous attraction electrodes (). The downmost dielectric layer (), the intermediate dielectric layer () and the topmost dielectric layer () are formed by spraying ceramic particles, and the attraction electrodes () are formed by spraying tungsten particles. The average pore diameter and porosity of the downmost dielectric layer () are set maximum, and those of the topmost dielectric layer () are set minimum.

Substrate suction apparatus and method for manufacturing the same

A bipolar electrostatic chuck which has excellent dielectric breakdown strength and provides excellent attracting performance. The bipolar electrostatic chuck eliminates difficulty in dismounting a sample from a sample attracting plane as much as possible after application of a voltage to electrodes is finished. The bipolar electrostatic chuck is provided with a first electrode and a second electrode in an insulator and permits a surface of the insulator to be the sample attracting plane. The insulator has the first electrode, an interelectrode insulating layer and the second electrode in this order from the sample attracting plane in the depth direction. The second electrode has a region not overlapping with the first electrode in a normal line direction of the sample attracting plane.

Bipolar electrostatic chuck

Provided are an apparatus for and a method of removing foreign materials from a substrate which reliably remove the foreign materials, eliminate a chance of redeposition of the foreign materials, and are applicable even to large-size substrates. The apparatus for removing foreign materials includes electrostatic chucks () forming a substrate chucking surface () to which the substrate () is attracted; a resin sheet supplying means () for supplying a resin sheet () to the substrate chucking surface (); resin sheet collecting means () for collecting the supplied resin sheet (); and a substrate transfer means for transferring the substrate (). The substrate () supplied to the electrostatic chucks () by the substrate transfer means is attracted to the substrate chucking surface () through the resin sheet (), and a foreign material () deposited on a side of the substrate chucking surface () of the substrate () is transferred onto the resin sheet () and removed.

Apparatus for removing foreign material from substrate and method for removing foreign material from substrate

An electrostatic chuck having excellent chucking force and holding force is provided. The electrostatic chuck includes a laminate structure in which a first insulating layer, a first electrode layer, an interelectrode insulating layer, a second electrode layer and a second insulating layer are successively laminated on a metal base in an order of increasing distance from the metal base. The second electrode layer includes a pattern electrode having a plurality of opening portions within a flat area, and a shortest distance X between mutually opening portions and a length L of a line segment formed by feet of perpendiculars when barycenters of the adjacent opening portions are projected to a virtual line which is a straight line parallel to the shortest distance X satisfy L/X&#x2267;1.5 and L&#x3c;2.6 mm.

Electrostatic chuck and electrode sheet for electrostatic chuck

Provided is a method of manufacturing a gas supply structure for use in an electrostatic chuck apparatus having an electrostatic chuck on the upper surface side of a metal base (), the gas supply structure being capable of eliminating contamination due to nonuniform cooling gas jetting quantities and deposition of a thermally spraying material and the like. The method of manufacturing the gas supply structure for supplying a cooling gas supplied from the lower surface side of the metal base () to the back surface of a substrate (W) attracted to an upper insulating layer () side, through a gas supply path () provided on the metal base (), the method including: prior to a step of forming a lower insulating layer () by thermally spraying a ceramic powder on the upper surface side of the metal base (), a step of forming an attracting electrode (), and a step of forming the upper insulating layer (), a step of blocking a gas supply path outlet () on the upper surface side of the metal base () with an adhesive (), the adhesive containing a filler made of the same material as that of the ceramic powder that is used for forming the lower insulating layer (); and a step of opening a hole toward the gas supply path outlet () of the metal base () after forming the upper insulating layer (), to thereby form a through hole () reaching the gas supply path ().

Method of manufacturing an electrostatic chuck

Provided is a power feeding structure of an electrostatic chuck including a lower insulation layer, an electrode layer and a surface insulation dielectric layer formed on an upper surface side of a metal substrate in order from the metal substrate, in which the lower insulation layer, the electrode layer and the surface insulation dielectric layer are not cracked easily. The power feeding structure of an electrostatic chuck includes: a through hole formed through an upper surface and a lower surface of the metal substrate; a power feeding terminal disposed in the through hole for supplying a voltage supplied from a lower surface side of the metal substrate to the electrode layer formed on the upper surface side of the metal substrate; and an insulation holding member formed of an electric insulating material for insulating an inner wall of the through hole from the power feeding terminal and for holding the power feeding terminal, and the power feeding terminal includes a power feeding end portion that protrudes to the upper surface side of the metal substrate, and a tip of the power feeding end portion is positioned at the electrode layer side with respect to an interface between the electrode layer and the lower insulation layer, and on and under an interface between the electrode layer and the surface insulation dielectric layer.

Feeding structure of electrostatic chuck, method for producing the same, and method for regenerating feeding structure of electrostatic chuck

An electrostatic chuck electrode sheet which allows the difference in capacitance between electrodes due to the presence or absence of a substrate to be increased to a level which can be accurately detected using a known substrate detection device, and allows an electrostatic chuck to exhibit an excellent attraction force, and an electrostatic chuck using the electrode sheet, are disclosed. The electrode sheet has a layered structure in which a first insulating layer, a first electrode layer, an inter-electrode insulating layer, a second electrode layer, and a second insulating layer are stacked and attracts a substrate on the first insulating layer, the first electrode layer having a plurality of openings in a specific planar area, and the second electrode layer having opening equivalent portions provided at positions at which the openings in the first electrode layer are projected onto the second electrode layer in a depth direction of the electrode sheet and having almost the same area as the projected openings, and connection portions that connect the opening equivalent portions. The electrostatic chuck is formed using the electrode sheet.

Electrode sheet for electrostatic chuck, and electrostatic chuck

A bipolar electrostatic including a chuck main body having a mounting surface; an annular electrode member formed in an annular configuration wit a center opening and fixed onto the mounting surface of the chuck main body though an adhesive layer; an inner electrode member disposed at a given clearance from the annular electrode member within the center opening of the annular electrode member and fixed onto the mounting surface through the adhesive layer; and an outer electrode member disposed at a given clearance from the annular electrode member outside of the annular electrode member and fixed onto the mounting surface through the adhesive layer.

An electrostatic chucking device having a laminated structure formed by sequentially laminating a first insulation layer, an electrode layer, and a second insulation layer on a metal substrate. The first and second insulation layers are formed from polyimide films. At least one adhesion layer is provided between the metal substrate and the first insulation layer, and is a thermoplastic polyimide-based adhesive film having a film thickness of 5 to 50 &#x3bc;m.

Electrostatic chucking device and manufacturing method thereof

To provide an aluminium composite structure having a highly airtight channel therein, including: a core material having a concave groove on a surface; a covering material made up of aluminium or aluminium alloy which covers the surface of the core material other than an inner surface of the concave groove; and a lid which is firmly fixed to the covering material to close an opening of the concave groove of the core material, forms a channel for running a heat exchange medium therein, and is made up of the aluminium or aluminium alloy, and a method of manufacturing the same.

Aluminium composite structure having a channel therein and method of manufacturing the same

A shaping mold for the production of ultra-thin shaped rubber articles, has a main body which is dipped into a latex liquid so as to make the latex adhered to the surface of the main body. The adhered latex is heat-dried to form an ultra-thin shaped rubber article over the surface. The mold is such that at least the surface of its main body is made of an amorphous carbon and that its bottom part is fitted with electrifying electrodes and has therebetween a heating area to be heated by resistance heating due to its electrification. The same shaping mold from its dipping step through the inspecting step of inspecting the shaped article as adhered to the surface of the mold. In the heat-drying step of the method, the shaped article as adhered to the surface of the shaping mold is heated and dried from the inside of the mold with preventing as much as possible formation of pin holes in the shaped article.

Growing community of inventors

Tokyo, Japan

Kinya Miyashita