Hachioji, Japan

Kimiko Mashimo


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 74(Granted Patents)


Location History:

  • Hachioji, JP (2014 - 2017)
  • Tokyo, JP (2018)

Company Filing History:


Years Active: 2014-2018

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Kimiko Mashimo: Innovator in Substrate Cleaning Technologies

Introduction

Kimiko Mashimo is a prominent inventor based in Hachioji, Japan. She has made significant contributions to the field of substrate cleaning methods, holding a total of four patents. Her innovative approaches have advanced the technology used in electronic device manufacturing.

Latest Patents

One of her latest patents is a substrate cleaning method for removing oxide film. This method utilizes radicals generated by plasma, which are fed into a treatment chamber through multiple holes in a partition plate. By mixing these radicals with a treatment gas, the excitation energy of the radicals is suppressed, allowing for high Si-selectivity in substrate surface treatment. This process effectively removes native oxide film and organic matter without compromising the flatness of the substrate surface.

Another notable patent is for a deposition apparatus and electronic device manufacturing method. This apparatus features a shutter storage unit connected to a processing chamber, which stores a shutter in a retracted state within an exhaust chamber. A shield member surrounds the opening of the shutter storage unit, providing an exhaust path that communicates with the exhaust port of the exhaust chamber. This design enhances the efficiency of the deposition process.

Career Highlights

Kimiko Mashimo is currently employed at Canon Anelva Corporation, where she continues to develop innovative technologies. Her work has been instrumental in improving substrate cleaning methods, which are crucial for the production of high-quality electronic devices.

Collaborations

She collaborates with notable colleagues, including Nobuo Yamaguchi and Shinya Nagasawa. Their combined expertise contributes to the advancement of technologies in their field.

Conclusion

Kimiko Mashimo's contributions to substrate cleaning technologies and electronic device manufacturing highlight her role as a leading inventor. Her innovative patents reflect her commitment to advancing technology in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…