The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2016
Filed:
Sep. 07, 2012
Applicants:
Nobuo Yamaguchi, Tama, JP;
Kimiko Mashimo, Hachioji, JP;
Shinya Nagasawa, Kawasaki, JP;
Inventors:
Assignee:
CANON ANELVA CORPORATION, Kawasaki-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/56 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/34 (2013.01); C23C 14/564 (2013.01); H01J 37/32477 (2013.01); H01J 37/32504 (2013.01); H01J 37/3411 (2013.01); H01J 37/3417 (2013.01); H01J 37/3447 (2013.01);
Abstract
It is an object of this invention to prevent a deposited film from adhering to an exhaust chamber so as to suppress the generation of particles. A sputtering apparatus () includes a shutter accommodation unit () which is detachably placed in an exhaust chamber () and accommodates a shutter () in a retracted state, and shield members () which at least partially cover the exhaust port of the exhaust chamber (), and are at least partially formed around an opening portion of the shutter accommodation unit ().