Hwaseong, South Korea

Kil Soo Lee

This inventor holds 1 USPTO granted patent. Top assignee: Auros Technology, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kil Soo Lee. Retrieved from https://idiyas.com/inventor/kil-soo-lee-bbvbzf9c

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Kil Soo Lee - Innovator in Overlay Measurement Technology

Introduction

Kil Soo Lee is a prominent inventor based in Hwaseong-si, South Korea. He is known for his contributions to the field of overlay measurement technology. With a focus on precision and accuracy, Lee has developed innovative solutions that enhance the manufacturing processes in the semiconductor industry.

Latest Patents

Kil Soo Lee holds 1 patent for an overlay measurement device. This device is designed to measure the error between a first overlay mark and a second overlay mark that are formed on different layers of a wafer. The device includes a light source, a first beam splitter that splits the emitted beam into two, and a first color filter that adjusts the center wavelength and bandwidth of one of the beams. This adjustment allows for optimal image acquisition of the first overlay mark.

Career Highlights

Lee is currently employed at Auros Technology, Inc., where he continues to innovate and develop advanced measurement technologies. His work has significantly impacted the efficiency and accuracy of overlay measurements in semiconductor manufacturing.

Collaborations

Some of his notable coworkers include Sun Hyoung Lee and Seung Soo Lee, who contribute to the collaborative environment at Auros Technology, Inc. Their combined expertise fosters innovation and drives the development of cutting-edge technologies.

Conclusion

Kil Soo Lee's contributions to overlay measurement technology exemplify his commitment to innovation in the semiconductor industry. His patent for the overlay measurement device showcases his ability to address complex challenges in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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