The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2024

Filed:

Sep. 11, 2019
Applicant:

Auros Technology, Inc., Hwaseong-si, KR;

Inventors:

Sun Hyoung Lee, Pyeongtaek-si, KR;

Kil Soo Lee, Hwaseong-si, KR;

Seung Soo Lee, Incheon, KR;

Gyu Nam Park, Goyang-si, KR;

Assignee:

AUROS TECHNOLOGY, INC., Hwaseong-si, KR;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/09 (2006.01); G02B 27/10 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G02B 27/0955 (2013.01); G02B 27/1006 (2013.01); G03F 7/70641 (2013.01);
Abstract

An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers formed on a wafer is proposed. The device includes a light source, a first beam splitter configured to split a beam emitted from the light source into two beams, a first color filter configured to adjust a center wavelength and a band width of one of the beams split by the first beam splitter so that the center wavelength and the band width of one of the beams become suitable for acquiring an image of the first overlay mark.


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