Kikuo Douta

Title: **The Innovative Mind of Kikuo Douta: A Pioneer in Microscopic Pattern Formation**

Introduction

Kikuo Douta, an accomplished inventor based in Hachioji, Japan, has made significant strides in the field of microscopic pattern formation. With a total of four patents to his name, he stands out as a notable innovator in the realm of photolithography and pattern processing technologies.

Latest Patents

Among Douta's latest achievements is a groundbreaking method of forming a microscopic pattern using far UV pattern exposure. This innovative approach involves a film of photoresist that contains phenolic hydroxyl groups. The process begins with irradiation from far-ultraviolet radiation, followed by development with an alkaline aqueous solution. The result is a resist pattern that is highly immune to dry etching, allowing for the creation of microscopic patterns with exceptional precision. Moreover, by incorporating an azide of a specified structure, the sensitivity of the photoresist to far-ultraviolet radiation is significantly enhanced.

Another notable patent details a method of forming a microscopic pattern using a negative photoresist that contains benzene rings. This method requires the photoresist to be irradiated with short-wavelength ultraviolet radiation, after which it is developed to yield a photoresist pattern with an inverted trapezoid sectional shape. With this innovation, the previously cumbersome lift-off process can be executed with great ease, streamlining production and enhancing efficiency.

Career Highlights

Kikuo Douta's professional journey is closely associated with his work at Hitachi, Ltd., a prominent company known for its technological innovations. Throughout his career, Douta has dedicated himself to advancing the capabilities of microscopic pattern technology, making significant contributions to both academic and industrial applications.

Collaborations

Douta has worked alongside notable colleagues, including Hiroshi Yanazawa and Toshiharu Matsuzawa. Together, they have collaborated on various projects that have led to groundbreaking advancements in microfabrication techniques, reinforcing the impact of teamwork in the world of innovation.

Conclusion

Kikuo Douta is a distinguished inventor whose work continues to influence the field of microscopic pattern formation. With a focus on improving photolithography processes, his innovations have the potential to transform various applications in technology and manufacturing. As he continues to push the boundaries of what's possible, Douta exemplifies the spirit of innovation that drives the industry forward.