The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 1985
Filed:
Jul. 30, 1981
Applicant:
Inventors:
Toshiharu Matsuzawa, Higashimurayama, JP;
Kikuo Douta, Hachioji, JP;
Takao Iwayanagi, Tokyo, JP;
Hiroshi Yanazawa, Tokyo, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; C23F / ;
U.S. Cl.
CPC ...
427282 ; 427 98 ; 430194 ; 430197 ; 430270 ; 430313 ; 430314 ; 430315 ; 430319 ; 430324 ; 430326 ;
Abstract
A negative photoresist having benzene rings is irradiated with short-wavelength ultraviolet radiation, and is developed to form a photoresist pattern whose sectional shape is an inverted trapezoid. Using the photoresist pattern, the lift-off process having heretofore required troublesome steps can be performed very easily.