Tokyo, Japan

Hiroshi Yanazawa

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 53(Granted Patents)


Location History:

  • Tokyo, JA (1976)
  • Hinodemachi, JP (1982)
  • Tokyo, JP (1985 - 1986)

Company Filing History:


Years Active: 1976-1986

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4 patents (USPTO):Explore Patents

Title: The Innovative Mind of Hiroshi Yanazawa

Introduction

Hiroshi Yanazawa, located in Tokyo, Japan, is an esteemed inventor recognized for his contributions to the field of microscopic pattern formation. With a notable portfolio of four patents, Yanazawa has made significant strides in advancing the technology used in various industries.

Latest Patents

Yanazawa's latest patents include groundbreaking methods of forming microscopic patterns. The first patent details a method involving the use of a film of a photoresist containing phenolic hydroxyl groups. This film is irradiated with far-ultraviolet radiation and subsequently developed with an alkaline aqueous solution. The resulting resist pattern facilitates dry etching, allowing for the creation of precise microscopic patterns. Enhanced sensitivity to far-ultraviolet radiation is achieved by adding an azide of a specific structure to the photoresist.

His second recent patent showcases a different approach using a negative photoresist with benzene rings that is also irradiated with short-wavelength ultraviolet radiation. This method enables the development of a photoresist pattern with an inverted trapezoid shape, simplifying the lift-off process that traditionally required complex steps.

Career Highlights

Yanazawa’s career is marked by his association with Hitachi, Ltd., a prominent multinational corporation that enhances his innovative work. His expertise in developing methods for microscopic pattern formation has positioned him as a key player in the advancement of nanotechnology.

Collaborations

Throughout his career, Yanazawa has collaborated with noted colleagues such as Kikuo Douta and Toshiharu Matsuzawa. These collaborations have enriched his research endeavors, leading to the successful development of multiple patents that drive technological advancements in the field.

Conclusion

Hiroshi Yanazawa stands out as a prominent inventor whose innovative methodologies continue to shape the future of microscopic pattern formation. His relentless pursuit of excellence in technology at Hitachi, Ltd., combined with effective collaborations, underscores his valuable contributions to the field. With each patent, Yanazawa further cements his legacy as a leading innovator in Japan and beyond.

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