This inventor holds 2 USPTO granted patents. Top assignee: Electronics and Telecommunications Research Institute. Active years: 2006-2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006-2007
Title: Kiju Im: Innovator in Semiconductor Technology
Introduction
Kiju Im is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced MOSFET devices. With a total of 2 patents to his name, his work focuses on enhancing the performance and efficiency of electronic components.
Latest Patents
Kiju Im's latest patents include innovations such as the "Ultra short channel field effect transistor and method of fabricating the same." This invention provides a MOSFET with an ultra-short channel length, featuring a silicon wire channel region with a three-dimensional structure. The design incorporates a source/drain junction formed in a silicon conductive layer on both sides of the silicon wire channel region. Additionally, a gate electrode is positioned on the upper surface of the silicon wire channel region, separated by a high dielectric constant gate insulating layer. The unique triangular or trapezoidal section of the silicon wire channel region is achieved by utilizing different etch rates based on the planar orientation of the silicon. The source/drain junction is created through a solid-state diffusion method.
Another notable patent is the "MOSFET device with nanoscale channel and method of manufacturing the same." This invention describes an SOI MOSFET device featuring a nanoscale channel, which includes a source/drain region with both a shallow extension region and a deep junction region formed by solid-phase diffusion. The manufacturing method allows for simultaneous formation of these regions using silicon oxide films doped with different impurities. This innovation enables scaling down the effective channel length by adjusting the thickness and etching rate of the second silicon oxide film. The design also simplifies impurity distribution control in the channel, preventing changes in the device's threshold voltage.
Career Highlights
Kiju Im is affiliated with the Electronics and Telecommunications Research Institute, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of electronic devices, making them more efficient and reliable.
Collaborations
Kiju Im has collaborated with notable colleagues, including Wonju Cho and Seong Jae Lee. Their combined expertise has contributed to the successful development of innovative technologies in the semiconductor field.
Conclusion
Kiju Im's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
