Kevin Powell

Title: Kevin Powell: Innovator in Substrate Processing Technologies

Introduction

Kevin Powell is a notable inventor based in Bristol, GB, recognized for his contributions to substrate processing technologies. With a total of three patents to his name, Powell has made significant advancements in methods related to etching and processing substrates.

Latest Patents

One of his latest patents is a method of processing substrates, which involves etching a generally vertical structure in a substrate using a cyclic process. This process includes an etch step with a reactive etch gas and a deposition step for applying a protective polymer on the side walls of the etched structure. Additionally, the method features a cleaning process that utilizes plasma to remove materials derived from the etchant gas. Another significant patent is a method of etching a substrate on an electrostatic chuck, which defines a gas cooling path at the substrate/chuck interface. This method includes electrostatically clamping the substrate, detecting the end point for etching, and over etching the wafer at a lower power.

Career Highlights

Throughout his career, Kevin Powell has worked with several companies, including Aviza Technology Limited and Trikon Equipment Limited. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

Some of his notable coworkers include David Andrew Tossell and Nicholas John Appleyard, who have collaborated with him on various projects.

Conclusion

Kevin Powell's innovative work in substrate processing has led to significant advancements in the field. His patents reflect a deep understanding of the complexities involved in etching and processing substrates, showcasing his role as a key inventor in this area.