The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2001
Filed:
Sep. 10, 1998
Applicant:
Inventors:
Kevin Powell, Bristol, GB;
David Andrew Tossell, Portishead, GB;
Alan Victor Iacopi, West Sussex, GB;
Mark Stephen Puttock, West Sussex, GB;
Assignee:
Trikon Equipments Limited, Gwent, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01T 2/300 ;
U.S. Cl.
CPC ...
H01T 2/300 ;
Abstract
An electrostatic chuck,for a plasma reactor apparatus,comprises a base metallic section,, a pair of electrodes,set in bonding material,and electrically insulated from the base by a plate,and a thick dielectric layer,(e.g. 0.5 to 1.5 mm), which covers the electrodes,and bonding material,and forms the support surfaces for wafers